UV/Cl工艺对三氯生的去除与降解机理研究

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Abstract Degradation of triclosan(TCS), a kind of broad-spectrum antimicrobial agent, was studied in water by the UV/chlorine advanced oxidation process. The removal of TCS by single UV, single chlorination and the UV/chlorine process was compared. The effect of different factors on the UV/chlorine process was investigated, including UV intensity, initial residual chlorine, pH value and ammonia concentration. The degradation mechanism and the ecological risk were further discussed. The results indicated that TCS had higher removal by the UV/chlorine process compared with single UV and single chlorination. The reaction fitted pseudo-first-order kinetics. The degradation rate increased with the increase of UV intensity and initial residual chlorine, while decreased with the increase of ammonia concentration. Seventeen intermediates were identified by HRMS Q-TOF, and the possible degradation pathway was also proposed. Both luminescent bacteria experiment and ECOSAR prediction showed that intermediates with high toxicity were produced on TCS degradation by the UV/chlorine process. With the process of reaction, intermediates generated with lower toxicity, and the ecological environment risk was reduced.

Key words： triclosan (TCS) UV/chlorine advanced oxidation process influencing factors degradation mechanism toxicity evaluation

Received: 06 August 2018

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X522

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	Articles by authors
	ZHOU Si-qi
	LI Jia-qi
	DU Er-deng
	LI Miao
	LIU Xiang

Cite this article:

ZHOU Si-qi,LI Jia-qi,DU Er-deng等. Removal and degradation mechanism of triclosan by the UV/chlorine process[J]. CHINA ENVIRONMENTAL SCIENCECE, 2019, 39(3): 1000-1008.

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http://www.zghjkx.com.cn/EN/ OR http://www.zghjkx.com.cn/EN/Y2019/V39/I3/1000

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